In microelectronic industry the chemical generation process is based on a classical mixing of DI water and gaz which leads to a good contacting between the two phases. The purpose of mixing is to produce a high interfacial area by dispersing the gaz phase in the form of bubbles into DI water. By using the microwave heat transfer device in conjunction with a coaxial double-inlet for both DI water and gaz, there is an interest in exploring the chemical generation application.This assumption is based on a molecular mixing due to the microwave induced motion of reaction products such as ions and polar molecules.

The measurement of the outlet mass flow rate and the related total temperature variation \Delta Tof the heat transfer as a fonction of microwave power at a given gaz flow provide information necessary for determining the dissolution process rate and efficiency and whether or not this chemical generation device is adapted to the microelectronic market. The contribution to the total temperature variation from the chemical generation process is the heat of dissolution. The absorption of this energy can be obtained by a low inlet temperature for DI water.

This process can be generalized to the small-sized chemical reactor market applied to the in-line microwave chemical production from two liquid phases. The presence of microwaves can reduce reaction time, increase reaction yield and also supplies the heat of reaction if necessary.

Safety warning :
In microwave chemical processing we recommend strongly to undertake no experimentations using a volatile and/or flammable solvent in an opened or closed circuit with the microwave heat transfert device. Pressures due to the temperature increase can reach very high values. Thus this field of interest must be conducted by engineers who have a good knowledge of microwave chemical processing.

Laisser un commentaire

Vous devez être connecté pour écrire un commentaire.